Chemical vapor deposition (CVD) technology
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Chemical vapor deposition (CVD) technology by K. A. Gesheva

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Published by Nova Science Publishers in Hauppauge, N.Y .
Written in


  • Chemical vapor deposition

Book details:

Edition Notes

StatementK.A. Gesheva and E.E. Chain (authors).
ContributionsChain, E. E.
LC ClassificationsTS695 .G47 2008
The Physical Object
Paginationp. cm.
ID Numbers
Open LibraryOL19970938M
ISBN 109781604565270
LC Control Number2008008046

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Chemical Vapor Deposition on *FREE* shipping on qualifying offers. This course is designed to assist equipment and process technicians and operators solve CVD-related problems and gain a better understanding of CVD processing issues. To this endFormat: Spiral-bound. This chapter reviews the chemical vapor deposition (CVD) of non-metallic elements like: boron, silicon, and germanium. Boron is a light element produced by CVD in the form of coatings and fibers. It has a hexagonal structure based on the icosahedron and acts as an electrical insulator. It has good chemical resistance and is hard and brittle. Chemical Vapor Deposition: Principles and Applications [M. L. Hitchman, K. F. Jensen] on *FREE* shipping on qualifying offers. This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced Price: $ About this book Chemical Vapour Deposition (CVD) involves the deposition of thin solid films from chemical precursors in the vapour phase, and encompasses a variety of deposition techniques, including a range of thermal processes, plasma enhanced CVD (PECVD), photon- initiated CVD, and atomic layer deposition (ALD).

Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible . Chemical Vapor Deposition: Thermal and Plasma Deposition of Electronic Materials [Srinivasan Sivaram] on *FREE* shipping on qualifying offers. In early I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe developmentAuthor: Srinivasan Sivaram. The authoritative reference on catalytic chemical vapor deposition, written by the inventor of the technology. This comprehensive book covers a wide scope of Cat-CVD and related technologies from the fundamentals to the many applications, including the design of a Cat-CVD apparatus. Principles of Chemical Vapor Deposition: What's Going on Inside the Reactor by Daniel M. Dobkin and Michael K. Zuraw Kluwer Academic The book version of this web site tutorial, "Principles of Chemical Vapor Deposition", by Daniel M. Dobkin and Michael K. Zuraw, published by Kluwer Academic, is available from Amazon. The book has most of the content of the web site.

If the address matches an existing account you will receive an email with instructions to retrieve your username. From , the journal Chemical Vapor Deposition will be published as a section of the journal Advanced Materials click here for more information.. All queries should be directed to the Editorial Office at [email protected] Introduction to Chemical Vapor Deposition (CVD) J. R. Creighton and P. Ho Sandia National Laboratories P.O. Box , MS Albuquerque, NM Introduction Chemical vapor deposition (CVD) is a widely used materials-processing technology. The majority of its applications involve applying solid thin-film coatings to surfaces, but it is also. Chemical vapor deposition (CVD) is a process whereby a solid material is deposited from the reaction of vapor-phase chemical reactants on or close to a substrate surface. The solid material is obtained as a coating, a powder, or single crystals.